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High Pressure POU Purifier

High Pressure POU Purifier

Flow range:100-1000LPM

Consultation Return

 OVERVIEW

POU purifier adopts catalytic adsorption technology to remove the impurities in the source gas at room temperature. POU purifier can be customized according to the different needs of customers(including connection size,length or panel,etc.).


 CHARACTERISTICS

•Flow range:100-1000 LPM

•High precision filter:0.003μm

• Outlet impurities<1ppb

•Returned to EGP factory for regeneration

•Inlet and outlet valves and Connection size

• 316L SS EP Vessel

•Service life over 20 years

• CE certificate

•Customized according to the different needs of customers


 REMOVAL EFFICIENCY

Remove the impurities such as H2O、O₂、Co、CO₂、H₂、NMHC <1ppb (inlet≥5N ), also can remove acids, bases and refractory compounds.

 Applicable gases:  N₂、H₂、O₂、Ar、He、Kr、Ne、Xe 、CDA 、CH₄、CO₂、Cl₂、BF₃、HCl、

GeCl₄、GeH₄、H2S、H2Se、HBr、SiHCl₃ 、SO₂ and etc.


 POU INDEX TABLE

Model

Max Flow Rate (SLPM)

Max Operation Pressure

(Mpa)

Connection Size

Overall Length 

(face to face)

Outside Diameter

(mm)

EGP100-HP

100

18.0

1/4"MVCR

15.55"±0.03"

60

EGP100-SP

100

24.0

1/4"MVCR

15.63"±0.03"

60

EGP250-HP

250

18.0

1/4"MVCR

19.88"±0.03"

102

EGP250-SP

250

24.0

1/4"MVCR

20.04"±0.03"

102

EGP500-HP

500

18.0

1/2"MVCR

22.95"±0.03"

133

EGP500-SP

500

24.0

1/2"MVCR

23.19"±0.03"

133

EGP1000-HP

1000

18.0

1/2"MVCR

42.09"±0.06"

180

EGP1000-SP

1000

24.0

1/2"MVCR

45.55"±0.06"

180

▶ Note:Only the specification and configuration of the standard models are listed in the table.Please contact EGP for more special requirements.


 APPLICATION

• Large Scale Integration

• Preform Fabrication

• Discrete Device

• Semiconductor Equipment Integration‌

• Silicon Wafers 、Substrate and Epitaxy

• Ultra-pure,mixture,and standard purifier

• LASER

• Purge、Carrier gas

• LED、LCD、OLED

• Academic and Research Institutions

• High-efficiency Solar Cell

• Pharmaceutical and Industry