❖ OVERVIEW
EGS7-G hydrogen purifier operates with single or multiple getter columns connected in parallel, purifying at high temperatures without regeneration. The getters can be directly replaced on site after saturation, in purification mode getter working temperature is about 500℃。

❖ CHARACTERISTICS
•Flow range: 10-300Nm3/h | •High precision filter:0.003μm |
•Outlet impurities<1ppb | •Remove impurities such as CH₄ |
•316L SS EP Vessel | •Customized according to the different needs of customers |
❖ REMOVAL EFFICIENCY
APPLICABLE GAS | H₂ | |
MODEL | EGS7-G | |
CRAFTS | GET | |
IMPURITY | INLET | OUTLET |
ppm | ppb | |
H₂O | <5 | <1 |
O₂ | <3 | <1 |
Co | <1 | <1 |
CO₂ | <1 | <1 |
N₂ | <1 | <1 |
CH₄ | <0.5 | <1 |
NMHC | <1 | <1 |
PARTICLES | 一 | ≤1pcs/m³@0.003μm) |
FLOW RANGE | 一 | 10-300Nm³h |
▶ Note:Only the specification and configuration of the standard models are listed in the table.Please contact EGP for more special requirements.
❖ INDEX TABLE
Flow range Nm³/h | Applicable gas | Crafts | Pressure Range Bar | Reference Dimensions mm |
10-30 | H₂ | 1 x Getter | 3.5-10 | 700*800*1920 |
50-60 | H₂ | 1 x Getter | 3.5-10 | 850*1000*1920 |
70-120 | H₂ | 2 x Getter | 3.5-10 | 1400*1000*1840 |
150-200 | H₂ | 2 x Getter | 3.5-10 | 2100*1300*2000 |
250-300 | H₂ | 3 x Getter | 3.5-10 | 2600*1340*2090 |
❖ APPLICATION
• Large Scale Integration | • Preform Fabrication |
• Discrete Device | • Semiconductor Equipment Integration |
• Silicon Wafers 、Substrate and Epitaxy | • Ultra-pure,mixture,and standard purifier |
• LASER | • Purge、Carrier gas |
• LED、LCD、OLED | • Academic and Research Institutions |
• High-efficiency Solar Cell | • Pharmaceutical and Industry |