❖ OVERVIEW
The H Series Purifier is a compact purifier that operates at elevated temperatures using heated getter alloy.Unlike POU ambient temperature purifiers,which primarily rely on catalytic adsorption technology and only utilize surface adsorption,the heated getter alloy technology fully leverages the entire volume of the alloy.Compared to POU purifiers,the H Series heated purifiers offer superior impurity removal efficiency and can remove CH₄,N₂,with longer life time.
❖ CHARACTERISTICS
•Flow range: 0.2-150LPM | •High precision filter:0.003μm |
•Outlet impurities<1ppb | •Automatic Power Control、Temperature、Predictive Maintenance Alert |
•Remove impurities of CH₄and N₂ | •Inlet and outlet valves and Connection size |
•316L SS EP Vessel | •Multiple Options Available |
• Direct Replacement | •Customized according to the different needs of customers |
❖ REMOVAL EFFICIENCY
Remove the impurities such as H2O、O₂、CO、CO₂、H₂、NMHC <1ppb (inlet≥5N ), also can remove acids, bases and refractory compounds.
Applicable gases: N₂、H₂、O₂、Ar、He、Kr、Ne、Xe 、CDA 、CH₄and etc.
❖ INDEX TABLE
Wall-mounted or cabinet options available | |||
Model | Max Flow Rate(SLPM) | Connection Size | Max Pressure Drop(MPA) |
EGH001 | 0.2 | 1/8"sleeve ferrule | 0.05 |
EGH003 | 5 | 1/4"VCR | 0.05 |
EGH050 | 50 | 1/4"VCR | 0.05 |
EGH075 | 75 | 1/4"VCR | 0.05 |
EGH100 | 100 | 1/2"VCR | 0.05 |
EGH150 | 150 | 1/2"VCR | 0.05 |
▶ Note:Only the specification and configuration of the standard models are listed in the table.Please contact EGP for more special requirements.
❖ APPLICATION
• Large Scale Integration | • Preform Fabrication |
• Discrete Device | • Semiconductor Equipment Integration |
• Silicon wafers 、Substrate and Epitaxy | • Ultra-pure,mixture,and standard purifier |
• LASER | • Purge、Carrier gas |
• LED、LCD、OLED | • Academic and Research Institutions |
• High-efficiency Solar Cell | • Pharmaceutical and Industry |