❖ OVERVIEW
EGS8-H(N2)、EGS5-A-H(He、Ne、Ar、Kr、Xe) high pressure purifier, up to 240Bar or even higher, alternating between ambient temperature purification and heated regeneration modes to realize 24H uninterrupted gas supply. It has perfect alarm, interlocking and data recording functions. Regeneration is achieved by heating and purging with a mixture of purified gas and hydrogen. During purification mode, the adsorption bed operates at room temperature, while during regeneration, the operating temperature ranges between 200-250℃. The reaction bed designed with extreme temperature compensation in accordance with national pressure vessel standards, ensuring safety and reliability.
EGS5-G-H(He、Ne、Ar、Kr、Xe) 、EGS9-G-H(N2)、EGS7-G-H(H2) Getter series high pressure purifier, up to 240Bar or even higher, purifying at high temperatures without regeneration to realize 24H uninterrupted gas supply. It has perfect alarm, interlocking and data recording functions. During purification mode, the operating temperature is about 400℃. The reaction bed designed with extreme temperature compensation in accordance with national pressure vessel standards, ensuring safety and reliability.
❖ CHARACTERISTICS
•Flow rate 100-240Nm3/h | •High precision filter:0.003μm |
•Outlet impurities<1ppb | •Fully automatic operation with 24-hour uninterrupted gas supply. |
•Remove CH4 impurity | •Service life over 20 years |
•316L SS EP Vessel | •Customized according to the different needs of customers |
❖ REMOVAL EFFICIENCY
APPLICABLE GAS | N2、H2、Ar、He、Kr、Ne、Xe | |
CRAFTS | GET/ADS | |
IMPURITY | INLET | OUTLET |
ppm | ppb | |
IMPURITY | — | On-demand customization |
PARTICLES | — | ≤1pcs/m³(@0.003μm) |
FLOW RANGE | — | 100-240Nm³h |
▶ Note:Only the specification and configuration of the standard models are listed in the table.Please contact EGP for more special requirements.
❖ INDEX TABLE
Flow range Nm³/h | Applicable gas | Crafts | Pressure Range Bar | Reference Dimensions mm |
EGS5-G-50-H | Ar、He、Kr、Ne、Xe | 50-100 | 100-240 | 850*900*2000 |
EGS5-G-100-H | Ar、He、Kr、Ne、Xe | 50-100 | 100-240 | 1150*1150*2000 |
EGS7-G-50-H | H₂ | 50-100 | 100-240 | 850*900*2000 |
EGS7-G-100-H | H₂ | 50-100 | 100-240 | 1150*1150*2000 |
EGS8-50-H | N₂ | 50-100 | 100-240 | 850*900*2000 |
EGS8-100-H | N₂ | 50-100 | 100-240 | 1150*1000*2100 |
EGS9-G-50-H | N₂ | 50-100 | 100-240 | 850*900*2000 |
EGS9-G-100-H | N₂ | 50-100 | 100-240 | 1150*1150*2000 |
❖ APPLICATION
• Large Scale Integration | • Preform Fabrication |
• Discrete Device | • Semiconductor Equipment Integration |
• Silicon Wafers 、Substrate and Epitaxy | • Ultra-pure,mixture,and standard purifier |
• LASER | • Purge、Carrier gas |
• LED、LCD、OLED | • Academic and Research Institutions |
• High-efficiency Solar Cell | • Pharmaceutical and Industry |
Address：No. 98, Pengcheng Avenue, National Economic Development Zone, Huangshi City, Hubei Province
Company address in Shanghai：No. 510B, Lane 500, Zhangheng Road, Pudong New Area, Shanghai
Shenzhen Company Address: Room 707, Block B, Building 10, Shenzhen Bay Technology Ecological Park, No. 10, High-tech South 9th Road, High-tech Zone Community, Yuehai Street, Nanshan District, Shenzhen City
Wuhan Company Address: Room 718, Building T2, Phase 1, Business Project (Optics Valley Headquarters Center), No. 766, Gaoxin Avenue, East Lake New Technology Development Zone, Wuhan City, Hubei Province
Telephone：Mr. Huang 13631567445
Telephone：Mr. Chen 15072068232
Website：http://www.egp9n.com
