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EGS6-A OXYGEN PURIFIER

EGS6-A OXYGEN PURIFIER

Flow range:10-50000CMH

Consultation Return

❖ OVERVIEW

EGS6-A oxygen purifier operates with multiple adsorption beds connected in parallel, alternating between ambient temperature purification and heated regeneration modes to realize 24H uninterrupted gas supply. It has perfect alarm, interlocking and data recording functions, automatic operation and switch regeneration after ADS completed purification mode automatically.

CHARACTERISTICS

•Flow range: 10-50000Nm3/h

•High precision filter:0.003μm

•Outlet impurities<1ppb

•Fully automatic operation with 24-hour uninterrupted gas supply.

•Service life over 20 years

•316L SS EP Vessel

•Customized according to the different needs of customers


REMOVAL EFFICIENCY

APPLICABLE  GAS

O₂

M O D E L

EGS6-A

C R A F T S

ADS

IMPURITY

INLET

OUTLET

ppm

ppb

H₂O

<3

<0.1

CO₂

<2

<0.1

NMHC

<1

<0.1

PARTICLES

——

≤1pcs/m³(@0.003μm)

FLOW RANGE

10-50000Nm³h


INDEX TABLE

Flow range

Nm³/h

Applicable gas

Crafts

Pressure Range

Bar

Reference Dimensions

mm

10-10

O₂

2 x ADS   

3.5-10

1050*515*1600

30-50

O₂

2 x ADS   

3.5-10

850*900*2000

60-70

O₂

2 x ADS   

3.5-10

1000*1150*2100

80-300

O₂

2 x ADS   

3.5-10

1350*1150*2100

400-1000

O₂

2 x ADS   

3.5-10

1800*1700*2450

1500-2000

O₂

2 x ADS   

3.5-10

2690*2390*2700

2500-3500

O₂

2 x ADS   

3.5-10

2650*2650*2650

4000-6000

O₂

2 x ADS   

3.5-10

2650*2650*2750

7000-12000

O₂

3 x ADS   

3.5-10

2900*4600*2750

12000-20000

O₂

4 x ADS   

3.5-10

2900*4600*2750

20000-50000

O₂

4 x ADS   

3.5-10

9000*2950*3400


APPLICATION

• Large Scale Integration

• Preform Fabrication

• Discrete Device

• Semiconductor Equipment Integration‌

• Silicon Wafers 、Substrate and Epitaxy

• Ultra-pure,mixture,and standard purifier

• LASER

• Purge、Carrier gas

• LED、LCD、OLED

• Academic and Research Institutions

• High-efficiency Solar Cell

• Pharmaceutical and Industry