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EGS5-H RARE GAS PURIFIER

EGS5-H RARE GAS PURIFIER

Flow range:10-300CMH

Consultation Return

❖ OVERVIEW

EGS5-H rare gas purifier operates with adsorption beds connected in series to getters. Two adsorption beds are connected in parallel, alternating between ambient temperature purification and high-temperature regeneration modes. Single or multiple getters are connected in parallel, purifying simultaneously at high temperatures without regeneration. The getter column can be directly replaced

CHARACTERISTICS

•Flow range: 10-300Nm3/h

•High precision filter:0.003μm

•Outlet impurities<1ppb

•Fully automatic operation with 24-hour uninterrupted gas supply.

•Remove CH4 impurity

•Service life over 20 years

•316L SS EP Vessel

•Customized according to the different needs of customers


REMOVAL EFFICIENCY

APPLICABLE GAS

Ar、He、Kr、Ne、Xe

MODEL

EGS5-H

CRAFTS

ADS+GET

IMPURITY

INLET

OUTLET

ppm

ppb

H₂O

<3

<1

O₂

<1.5

<1

Co

<1

<1

CO₂

<1

<1

H₂

<1

<1

N₂

<4

<1

CH₄

<0.5

<1

NMHC

<1

<1

PARTICLES

≤1pcs/m³@0.003μm)

    FLOW RANGE

10-300Nm³h

▶ Note:Only the specification and configuration of the standard models are listed in the table.Please contact EGP for more special requirements.


INDEX TABLE

Flow range

Nm³/h

Applicable gas

Crafts

Pressure Range

Bar

Reference Dimensions

mm

20-50

Ar、He、Kr、Ne、Xe

2 x ADS+1 x Getter

3.5-10

1700*1200*2200

60-100

Ar、He、Kr、Ne、Xe

2 x ADS+2 x Getter

3.5-10

1700*1650*2250

150-200

Ar、He、Kr、Ne、Xe

2 x ADS+2x Getter

3.5-10

1900*1800*2450

250-300

Ar、He、Kr、Ne、Xe

2 x ADS+3 x Getter

3.5-10

2450*1800*2550


APPLICATION

• Large Scale Integration

• Preform Fabrication

• Discrete Device

• Semiconductor Equipment Integration‌

• Silicon Wafers 、Substrate and Epitaxy

• Ultra-pure,mixture,and standard purifier

• LASER

• Purge、Carrier gas

• LED、LCD、OLED

• Academic and Research Institutions

• High-efficiency Solar Cell

• Pharmaceutical and Industry