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EGS5-H RARE GAS PURIFIER

EGS5-H RARE GAS PURIFIER

Flow range:10-300CMH

Consultation Return

❖ OVERVIEW

EGS5-H rare gas purifier operates with adsorption beds connected in series to getters. Two adsorption beds are connected in parallel, alternating between ambient temperature purification and high-temperature regeneration modes. Single or multiple getters are connected in parallel, purifying simultaneously at high temperatures without regeneration. The getter column can be directly replaced

❖ CHARACTERISTICS

•Flow range: 10-300Nm3/h

•High precision filter:0.003μm

•Outlet impurities<1ppb

•Fully automatic operation with 24-hour uninterrupted gas supply.

•Remove CH4 impurity

•Service life over 20 years

•316L SS EP Vessel

•Customized according to the different needs of customers


❖ REMOVAL EFFICIENCY

APPLICABLE GAS

Ar、He、Kr、Ne、Xe

MODEL

EGS5-H

CRAFTS

ADS+GET

IMPURITY

INLET

OUTLET

ppm

ppb

H₂O

<3

<1

O₂

<1.5

<1

Co

<1

<1

CO₂

<1

<1

H₂

<1

<1

N₂

<4

<1

CH₄

<0.5

<1

NMHC

<1

<1

PARTICLES

一

≤1pcs/m³@0.003μm)

    FLOW RANGE

—

10-300Nm³h

▶ Note:Only the specification and configuration of the standard models are listed in the table.Please contact EGP for more special requirements.


❖ INDEX TABLE

Flow range

Nm³/h

Applicable gas

Crafts

Pressure Range

Bar

Reference Dimensions

mm

20-50

Ar、He、Kr、Ne、Xe

2 x ADS+1 x Getter

3.5-10

1700*1200*2200

60-100

Ar、He、Kr、Ne、Xe

2 x ADS+2 x Getter

3.5-10

1700*1650*2250

150-200

Ar、He、Kr、Ne、Xe

2 x ADS+2x Getter

3.5-10

1900*1800*2450

250-300

Ar、He、Kr、Ne、Xe

2 x ADS+3 x Getter

3.5-10

2450*1800*2550


❖ APPLICATION

• Large Scale Integration

• Preform Fabrication

• Discrete Device

• Semiconductor Equipment Integration‌

• Silicon Wafers 、Substrate and Epitaxy

• Ultra-pure,mixture,and standard purifier

• LASER

• Purge、Carrier gas

• LED、LCD、OLED

• Academic and Research Institutions

• High-efficiency Solar Cell

• Pharmaceutical and Industry